DISTANZSTÜCK-MASKE FÜR PLÄTTCHEN AUF EINER SUBSTRATTRÄGER-SPANNVORRICHTUNG UND HERSTELLUNGSVERFAHREN DAFÜR

An apparatus for supporting a workpiece (116) spaced from a support surface (102) of a support chuck (104) comprises a spacing mask (100) made of metal on the support surface. Also claimed is a method of making a wafer spacing mask comprising depositing a metallic material in a pre-defined pattern o...

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Bibliographische Detailangaben
Hauptverfasser: SUGARMAN, MICHAEL N, GRUNES, HOWARD E, BURKHART, VINCENT E
Format: Patent
Sprache:ger
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Beschreibung
Zusammenfassung:An apparatus for supporting a workpiece (116) spaced from a support surface (102) of a support chuck (104) comprises a spacing mask (100) made of metal on the support surface. Also claimed is a method of making a wafer spacing mask comprising depositing a metallic material in a pre-defined pattern over a support surface of the chuck support member.