TEILCHENQUELLE FUER EINE REAKTIVE IONENSTRAHLAETZ- ODER PLASMADEPOSITIONSANLAGE

The invention relates to a particle source with which positive, negative, and neutral particles can be generated and applied on a substrate. The particle source comprises a container (26) in which a gas or gas mixture to be ionized is held. Into this container (26) an electromagnetic wave irradiates...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: GEISLER, MICHAEL, EICHHOLZ, STEFAN, JUNG, MICHAEL, KATZSCHNER, WERNER
Format: Patent
Sprache:ger
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Beschreibung
Zusammenfassung:The invention relates to a particle source with which positive, negative, and neutral particles can be generated and applied on a substrate. The particle source comprises a container (26) in which a gas or gas mixture to be ionized is held. Into this container (26) an electromagnetic wave irradiates which preferably is a microwave. A torus-shaped magnetic field, which is generated with the aid of permanent magnets (32, 33) or electromagnets, simultaneously projects into the container (26). With the aid of a special control grid configuration (38, 39, 40) it becomes possible to draw off positive, negative or neutral particles from the container (26).