Silicon based micro-optical collimating element for mid-infrared Quantum Cascade Lasers

A realization of a high numeric aperture, aspheric, silicon based collimating element for the mid-infrared (4 – 14 microns) Quantum Cascade Lasers, suited for mass production using computer driven reactive ion etching is presented.

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Bibliographische Detailangaben
Hauptverfasser: Hvozdara, Lubos, Logean, Eric, Di Francesco, Joab, Herzig, Hans Peter, Völkel, Reinhard, Eisner, Martin, Baroni, Pierre-Yves, Rochat, Michel, Muller, Antoine
Format: Web Resource
Sprache:eng
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Zusammenfassung:A realization of a high numeric aperture, aspheric, silicon based collimating element for the mid-infrared (4 – 14 microns) Quantum Cascade Lasers, suited for mass production using computer driven reactive ion etching is presented.