Silicon based micro-optical collimating element for mid-infrared Quantum Cascade Lasers
A realization of a high numeric aperture, aspheric, silicon based collimating element for the mid-infrared (4 – 14 microns) Quantum Cascade Lasers, suited for mass production using computer driven reactive ion etching is presented.
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Zusammenfassung: | A realization of a high numeric aperture, aspheric, silicon based collimating element for the mid-infrared (4 – 14 microns) Quantum Cascade Lasers, suited for mass production using computer driven reactive ion etching is presented. |
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