An Oxygen Tracer Study of InP Oxidation
The thermal oxidation process for InP results in a complex and process dependent oxide. From the observed self limiting behavior of the oxide growth, the rate limiting step is likely the diffusion of reaction species through the growing oxide film. O18 marker oxidation experiments with the resulting...
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creator | Liu, X Denker, M S Irene, E A |
description | The thermal oxidation process for InP results in a complex and process dependent oxide. From the observed self limiting behavior of the oxide growth, the rate limiting step is likely the diffusion of reaction species through the growing oxide film. O18 marker oxidation experiments with the resulting secondary ion mass spectroscopy (SIMS) depth profiles reveal that the oxidation takes place at the oxide surface by the outward migration of In and P, rather than at the oxide substrate interface. Based on the available results possible models for the oxidation are proposed. |
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fullrecord | <record><control><sourceid>dtic_1RU</sourceid><recordid>TN_cdi_dtic_stinet_ADA242832</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>ADA242832</sourcerecordid><originalsourceid>FETCH-dtic_stinet_ADA2428323</originalsourceid><addsrcrecordid>eNrjZFB3zFPwr6hMT81TCClKTE4tUgguKU2pVMhPU_DMCwBKZaYklmTm5_EwsKYl5hSn8kJpbgYZN9cQZw_dlJLM5Pjiksy81JJ4RxdHIxMjC2MjYwLSALY4JCI</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>report</recordtype></control><display><type>report</type><title>An Oxygen Tracer Study of InP Oxidation</title><source>DTIC Technical Reports</source><creator>Liu, X ; Denker, M S ; Irene, E A</creator><creatorcontrib>Liu, X ; Denker, M S ; Irene, E A ; NORTH CAROLINA UNIV AT CHAPEL HILL DEPT OF CHEMISTRY</creatorcontrib><description>The thermal oxidation process for InP results in a complex and process dependent oxide. From the observed self limiting behavior of the oxide growth, the rate limiting step is likely the diffusion of reaction species through the growing oxide film. O18 marker oxidation experiments with the resulting secondary ion mass spectroscopy (SIMS) depth profiles reveal that the oxidation takes place at the oxide surface by the outward migration of In and P, rather than at the oxide substrate interface. Based on the available results possible models for the oxidation are proposed.</description><language>eng</language><subject>BEHAVIOR ; DEPTH ; DIFFUSION ; GROWTH(GENERAL) ; INTERFACES ; IONS ; LIMITATIONS ; MASS SPECTROSCOPY ; MIGRATION ; OXIDATION ; OXIDES ; Physical Chemistry ; PROFILES ; RESPONSE ; SUBSTRATES ; SURFACES ; THERMOCHEMISTRY</subject><creationdate>1991</creationdate><rights>Approved for public release; distribution is unlimited.</rights><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>230,776,881,27544,27545</link.rule.ids><linktorsrc>$$Uhttps://apps.dtic.mil/sti/citations/ADA242832$$EView_record_in_DTIC$$FView_record_in_$$GDTIC$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>Liu, X</creatorcontrib><creatorcontrib>Denker, M S</creatorcontrib><creatorcontrib>Irene, E A</creatorcontrib><creatorcontrib>NORTH CAROLINA UNIV AT CHAPEL HILL DEPT OF CHEMISTRY</creatorcontrib><title>An Oxygen Tracer Study of InP Oxidation</title><description>The thermal oxidation process for InP results in a complex and process dependent oxide. From the observed self limiting behavior of the oxide growth, the rate limiting step is likely the diffusion of reaction species through the growing oxide film. O18 marker oxidation experiments with the resulting secondary ion mass spectroscopy (SIMS) depth profiles reveal that the oxidation takes place at the oxide surface by the outward migration of In and P, rather than at the oxide substrate interface. Based on the available results possible models for the oxidation are proposed.</description><subject>BEHAVIOR</subject><subject>DEPTH</subject><subject>DIFFUSION</subject><subject>GROWTH(GENERAL)</subject><subject>INTERFACES</subject><subject>IONS</subject><subject>LIMITATIONS</subject><subject>MASS SPECTROSCOPY</subject><subject>MIGRATION</subject><subject>OXIDATION</subject><subject>OXIDES</subject><subject>Physical Chemistry</subject><subject>PROFILES</subject><subject>RESPONSE</subject><subject>SUBSTRATES</subject><subject>SURFACES</subject><subject>THERMOCHEMISTRY</subject><fulltext>true</fulltext><rsrctype>report</rsrctype><creationdate>1991</creationdate><recordtype>report</recordtype><sourceid>1RU</sourceid><recordid>eNrjZFB3zFPwr6hMT81TCClKTE4tUgguKU2pVMhPU_DMCwBKZaYklmTm5_EwsKYl5hSn8kJpbgYZN9cQZw_dlJLM5Pjiksy81JJ4RxdHIxMjC2MjYwLSALY4JCI</recordid><startdate>199111</startdate><enddate>199111</enddate><creator>Liu, X</creator><creator>Denker, M S</creator><creator>Irene, E A</creator><scope>1RU</scope><scope>BHM</scope></search><sort><creationdate>199111</creationdate><title>An Oxygen Tracer Study of InP Oxidation</title><author>Liu, X ; Denker, M S ; Irene, E A</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-dtic_stinet_ADA2428323</frbrgroupid><rsrctype>reports</rsrctype><prefilter>reports</prefilter><language>eng</language><creationdate>1991</creationdate><topic>BEHAVIOR</topic><topic>DEPTH</topic><topic>DIFFUSION</topic><topic>GROWTH(GENERAL)</topic><topic>INTERFACES</topic><topic>IONS</topic><topic>LIMITATIONS</topic><topic>MASS SPECTROSCOPY</topic><topic>MIGRATION</topic><topic>OXIDATION</topic><topic>OXIDES</topic><topic>Physical Chemistry</topic><topic>PROFILES</topic><topic>RESPONSE</topic><topic>SUBSTRATES</topic><topic>SURFACES</topic><topic>THERMOCHEMISTRY</topic><toplevel>online_resources</toplevel><creatorcontrib>Liu, X</creatorcontrib><creatorcontrib>Denker, M S</creatorcontrib><creatorcontrib>Irene, E A</creatorcontrib><creatorcontrib>NORTH CAROLINA UNIV AT CHAPEL HILL DEPT OF CHEMISTRY</creatorcontrib><collection>DTIC Technical Reports</collection><collection>DTIC STINET</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Liu, X</au><au>Denker, M S</au><au>Irene, E A</au><aucorp>NORTH CAROLINA UNIV AT CHAPEL HILL DEPT OF CHEMISTRY</aucorp><format>book</format><genre>unknown</genre><ristype>RPRT</ristype><btitle>An Oxygen Tracer Study of InP Oxidation</btitle><date>1991-11</date><risdate>1991</risdate><abstract>The thermal oxidation process for InP results in a complex and process dependent oxide. From the observed self limiting behavior of the oxide growth, the rate limiting step is likely the diffusion of reaction species through the growing oxide film. O18 marker oxidation experiments with the resulting secondary ion mass spectroscopy (SIMS) depth profiles reveal that the oxidation takes place at the oxide surface by the outward migration of In and P, rather than at the oxide substrate interface. Based on the available results possible models for the oxidation are proposed.</abstract><oa>free_for_read</oa></addata></record> |
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source | DTIC Technical Reports |
subjects | BEHAVIOR DEPTH DIFFUSION GROWTH(GENERAL) INTERFACES IONS LIMITATIONS MASS SPECTROSCOPY MIGRATION OXIDATION OXIDES Physical Chemistry PROFILES RESPONSE SUBSTRATES SURFACES THERMOCHEMISTRY |
title | An Oxygen Tracer Study of InP Oxidation |
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