LASER DAMAGE STUDY OF THIN FILMS

LASER DAMAGE STUDY OF THIN FILMS

A concentrated effort was made, during the fourth quarterly period, to increase the laser damage threshold, E sub t, of aluminum oxide films. This objective was approached empirically. Selected vacuum deposition parameters were varied and the effect on E sub t was observed. E sub t for one-quarter w...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: Turner, Arthur F, Refermat, Stanley J
Format: Report
Sprache:eng
Schlagworte:
DAMAGE
DIELECTRIC FILMS
EXPERIMENTAL DATA
LASERS
Lasers and Masers
LIGHT
OPTICAL COATINGS
Optics
PHOTOCHEMICAL REACTIONS
Radiation and Nuclear Chemistry
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Beschreibung
Zusammenfassung:A concentrated effort was made, during the fourth quarterly period, to increase the laser damage threshold, E sub t, of aluminum oxide films. This objective was approached empirically. Selected vacuum deposition parameters were varied and the effect on E sub t was observed. E sub t for one-quarter wavelength and thirty-three quarter wavelengths films were increased by a factor of two over previously reported values. The one-half wavelength threshold was increased by a factor of six over the previous value. The one-quarter wavelength threshold spontaneously fell to half its original value two days after manufacture. See also AD0633554. Sponsored in part by the DARPA.