INVESTIGATION OF ULTRA HIGH VACUUM SPUTTERED THIN FILMS

Germanium films were sputtered onto quartz and self-substrates in a low-pressure thermionically supported discharge. Reflection electron diffraction and x-ray examination showed that over comparable temperature ranges the orientation of sputtered geranium on quartz films differed from that of evapor...

Ausführliche Beschreibung

Bibliographische Detailangaben

1. Verfasser:	Wolsky, S. P
Format:	Report
Sprache:	eng
Schlagworte:	ELECTRICAL PROPERTIES ELECTRON DIFFRACTION EPITAXIAL GROWTH GERMANIUM LOW PRESSURE MATERIAL FORMING METAL FILMS SEMICONDUCTORS SPUTTERING THIN FILMS X RAY DIFFRACTION
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