Influence of the crystallization thermal treatment on the structural and electrical properties of PZT thin films

Different methods have been proposed in the literature to deposit PZT thin films. Among these, chemical based processes have been revealed as a promising preparation route due to their low cost processing and the facility for controlling the stoichiometry of complex systems. The objective of this work was to investigate the influence of the time and temperature of crystallization on the physical properties of the Pb(Zr0.53Ti0.47)O3 thin films prepared by a hybrid method. The structural and microstructural dependence on the crystallization conditions of the PZT films were investigated by X-ray diffraction and atomic force microscopy. Dielectric and ferroelectric properties were also characterized and their behaviors were related to the structural evolution of films.