Anatomical and physiological responses of Aechmea blanchetiana (Bromeliaceae) induced by silicon and sodium chloride stress during in vitro culture
Salt stress is one of the most severe abiotic stresses affecting plant growth and development. The application of silicon (Si) is an alternative that can increase the tolerance of plants to various types of biotic and abiotic stresses. The objective was to evaluate salt stress's effect and Si...
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Veröffentlicht in: | PeerJ (San Francisco, CA) CA), 2023-01, Vol.11, p.e14624-e14624, Article e14624 |
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Sprache: | eng |
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Zusammenfassung: | Salt stress is one of the most severe abiotic stresses affecting plant growth and development. The application of silicon (Si) is an alternative that can increase the tolerance of plants to various types of biotic and abiotic stresses. The objective was to evaluate salt stress's effect
and Si's mitigation potential on
plants. For this purpose, plants already established
were transferred to a culture medium with 0 or 14 µM of Si (CaSiO
). After growth for 30 days, a stationary liquid medium containing different concentrations of NaCl (0, 100, 200, or 300 µM) was added to the flasks. Anatomical and physiological analyses were performed after growth for 45 days. The plants cultivated with excess NaCl presented reduced root diameter and effective photochemical quantum yield of photosystem II (PSII) (ΦPSII) and increased non-photochemical dissipation of fluorescence (qN). Plants that grew with the presence of Si also had greater content of photosynthetic pigments and activity of the enzymes of the antioxidant system, as well as higher values of maximum quantum yield of PSII (F
/F
), photochemical dissipation coefficient of fluorescence (qP) and fresh weight bioaccumulation of roots and shoots. The anatomical, physiological and biochemical responses, and growth induced by Si mitigated the effect of salt stress on the
plants cultivated
, which can be partly explained by the tolerance of this species to grow in sandbank (
) areas. |
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ISSN: | 2167-8359 2167-8359 |
DOI: | 10.7717/peerj.14624 |