Evidence of weak Anderson localization revealed by the resistivity, transverse magnetoresistance and Hall effect measured on thin Cu films deposited on mica

Evidence of weak Anderson localization revealed by the resistivity, transverse magnetoresistance and Hall effect measured on thin Cu films deposited on mica

We report the resistivity of 5 Cu films approximately 65 nm thick, measured between 5 and 290 K, and the transverse magnetoresistance and Hall effect measured at temperatures 5 K 

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Bibliographische Detailangaben
Veröffentlicht in:Scientific reports 2021-09, Vol.11 (1), p.17820-17820, Article 17820
Hauptverfasser: Díaz, Eva, Herrera, Guillermo, Oyarzún, Simón, Munoz, Raul C.
Format: Artikel
Sprache:eng
Schlagworte:
639/166/987
639/301
639/301/357
639/301/357/1016
639/301/357/995
639/766
639/766/25
639/925
Copper
Electromagnetism
Humanities and Social Sciences
Integrated circuits
Localization
multidisciplinary
Science
Science (multidisciplinary)
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Zusammenfassung:We report the resistivity of 5 Cu films approximately 65 nm thick, measured between 5 and 290 K, and the transverse magnetoresistance and Hall effect measured at temperatures 5 K 
ISSN:2045-2322
2045-2322
DOI:10.1038/s41598-021-97210-w