EUV and Hard X-ray Hartmann Wavefront Sensing for Optical Metrology, Alignment and Phase Imaging

For more than 15 years, Imagine Optic have developed Extreme Ultra Violet (EUV) and X-ray Hartmann wavefront sensors for metrology and imaging applications. These sensors are compatible with a wide range of X-ray sources: from synchrotrons, Free Electron Lasers, laser-driven betatron and plasma-base...

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Veröffentlicht in:Sensors (Basel, Switzerland) Switzerland), 2021-01, Vol.21 (3), p.874, Article 874
Hauptverfasser: de La Rochefoucauld, Ombeline, Dovillaire, Guillaume, Harms, Fabrice, Idir, Mourad, Huang, Lei, Levecq, Xavier, Piponnier, Martin, Zeitoun, Philippe
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Sprache:eng
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Zusammenfassung:For more than 15 years, Imagine Optic have developed Extreme Ultra Violet (EUV) and X-ray Hartmann wavefront sensors for metrology and imaging applications. These sensors are compatible with a wide range of X-ray sources: from synchrotrons, Free Electron Lasers, laser-driven betatron and plasma-based EUV lasers to High Harmonic Generation. In this paper, we first describe the principle of a Hartmann sensor and give some key parameters to design a high-performance sensor. We also present different applications from metrology (for manual or automatic alignment of optics), to soft X-ray source optimization and X-ray imaging.
ISSN:1424-8220
1424-8220
DOI:10.3390/s21030874