Transport diagrams of germanium double quantum dots/Si barriers using photocurrent measurement

We reported transport diagrams of self-assembled germanium (Ge) double quantum-dots (DQDs) using direct current measurement under illumination at wavelength (λ) of 850 nm and at the base temperature of 4.5 K. Ge DQDs with a coupling-barrier of Si, tunneling-barriers of Si 3 N 4 , and self-aligned p...

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Veröffentlicht in:Scientific reports 2024-09, Vol.14 (1), p.20749-7, Article 20749
Hauptverfasser: Wang, I-Hsiang, Chiu, Yu-Wen, Lin, Horng-Chih, Li, Pei-Wen
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Sprache:eng
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Zusammenfassung:We reported transport diagrams of self-assembled germanium (Ge) double quantum-dots (DQDs) using direct current measurement under illumination at wavelength (λ) of 850 nm and at the base temperature of 4.5 K. Ge DQDs with a coupling-barrier of Si, tunneling-barriers of Si 3 N 4 , and self-aligned p + -Si reservoirs were fabricated in a self-organized CMOS approach. Charge transport through the Ge-DQDs is facilitated by photon-assisted tunneling. Characteristic gate-controlled hexagonal-shaped cells over a wide range of hole occupancy are acquired thanks to hard-wall confinement. Large dimensions (Δ V G  > 200 mV) of hexagonal-shaped cells are favored for the operation of charge states, indicating that our Ge DQDs system is less susceptible to shot noises arising from external voltage sources. Estimated intra-QD and inter-QD charging energies are E C,R / E C,L  = 48.9 meV/42.7 meV and E Cm  = 7.8 meV, respectively.
ISSN:2045-2322
2045-2322
DOI:10.1038/s41598-024-71177-w