Effect of Phosphating Current Density on Microstructure and Adhesion Strength of Electrochemical Phosphating Film on A286 Alloy

The surface of A286 alloy easily undergoes passivation， making it difficult to deposit a phosphating film on surface of A286 alloy using the traditional chemical phosphating method.However， electrochemical phosphating can avoid the inhibitory effect of the passivation film on the phosphating reaction.Therefore， studying the influence of phosphating current density on the microstructure and properties of the phosphating film is necessary.In this study， a compact phosphating film with high film-base adhesion strength was formed on the surface of A286 alloy using electrochemical phosphating for the first time.The potential-time (φ-t) curves of the phosphating process under various current densities were mapped using an electrochemical workstation to examine the characteristics of the growth process of electrochemical phosphating films.The microstructure and morphology of the phosphating film were observed using a scanning electron microscope (SEM).Using an energy dispersive spectrometer (EDS) to analyze the chem