Transport in a Two-Channel Nanotransistor Device with Lateral Resonant Tunneling

We study field effect nanotransistor devices in the Si/SiO material system which are based on lateral resonant tunneling between two parallel conduction channels. After introducing a simple piecewise linear potential model, we calculate the quantum transport properties in the R-matrix approach. In t...

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Veröffentlicht in:Micromachines (Basel) 2024-10, Vol.15 (10), p.1270
Hauptverfasser: Wulf, Ulrich, Preda, Amanda Teodora, Nemnes, George Alexandru
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Sprache:eng
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Zusammenfassung:We study field effect nanotransistor devices in the Si/SiO material system which are based on lateral resonant tunneling between two parallel conduction channels. After introducing a simple piecewise linear potential model, we calculate the quantum transport properties in the R-matrix approach. In the transfer characteristics, we find a narrow resonant tunneling peak around zero control voltage. Such a narrow resonant tunneling peak allows one to switch the drain current with small control voltages, thus opening the way to low-energy applications. In contrast to similar double electron layer tunneling transistors that have been studied previously in III-V material systems with much larger channel lengths, the resonant tunneling peak in the drain current is found to persist at room temperature. We employ the R-matrix method in an effective approximation for planar systems and compare the analytical results with full numerical calculations. This provides a basic understanding of the inner processes pertaining to lateral tunneling transport.
ISSN:2072-666X
2072-666X
DOI:10.3390/mi15101270