Influence of Post-Annealing on the Structural and Nanomechanical Properties of Co Thin Films

The correlations between the microstructure and nanomechanical properties of a series of thermal annealed Co thin films were investigated. The Co thin films were deposited on glass substrates using a magnetron sputtering system at ambient conditions followed by subsequent annealing conducted at vari...

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Veröffentlicht in:Micromachines (Basel) 2020-02, Vol.11 (2), p.180
Hauptverfasser: Hwang, Yeong-Maw, Pan, Cheng-Tang, Lu, Ying-Xu, Jian, Sheng-Rui, Chang, Huang-Wei, Juang, Jenh-Yih
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Sprache:eng
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Zusammenfassung:The correlations between the microstructure and nanomechanical properties of a series of thermal annealed Co thin films were investigated. The Co thin films were deposited on glass substrates using a magnetron sputtering system at ambient conditions followed by subsequent annealing conducted at various temperatures ranging from 300 C to 800 C. The XRD results indicated that for annealing temperature in the ranged from 300 C to 500 C, the Co thin films were of single hexagonal close-packed (hcp) phase. Nevertheless, the coexistence of hcp-Co (002) and face-centered cubic (fcc-Co (111)) phases was evidently observed for films annealed at 600 C. Further increasing the annealing temperature to 700 C and 800 C, the films evidently turned into fcc-Co (111). Moreover, significant variations in the hardness and Young's modulus are observed by continuous stiffness nanoindentation measurement for films annealed at different temperatures. The correlations between structures and properties are discussed.
ISSN:2072-666X
2072-666X
DOI:10.3390/mi11020180