Contact Engineering Approach to Improve the Linearity of Multilevel Memristive Devices
Physical mechanisms underlying the multilevel resistive tuning over seven orders of magnitude in structures based on TiO /Al O bilayers, sandwiched between platinum electrodes, are responsible for the nonlinear dependence of the conductivity of intermediate resistance states on the writing voltage....
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Veröffentlicht in: | Micromachines (Basel) 2021-12, Vol.12 (12), p.1567 |
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Format: | Artikel |
Sprache: | eng |
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Zusammenfassung: | Physical mechanisms underlying the multilevel resistive tuning over seven orders of magnitude in structures based on TiO
/Al
O
bilayers, sandwiched between platinum electrodes, are responsible for the nonlinear dependence of the conductivity of intermediate resistance states on the writing voltage. To improve the linearity of the electric-field resistance tuning, we apply a contact engineering approach. For this purpose, platinum top electrodes were replaced with aluminum and copper ones to induce the oxygen-related electrochemical reactions at the interface with the Al
O
switching layer of the structures. Based on experimental results, it was found that electrode material substitution provokes modification of the physical mechanism behind the resistive switching in TiO
/Al
O
bilayers. In the case of aluminum electrodes, a memory window has been narrowed down to three orders of magnitude, while the linearity of resistance tuning was improved. For copper electrodes, a combination of effects related to metal ion diffusion with oxygen vacancies driven resistive switching was responsible for a rapid relaxation of intermediate resistance states in TiO
/Al
O
bilayers. |
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ISSN: | 2072-666X 2072-666X |
DOI: | 10.3390/mi12121567 |