Development of 8-inch Key Processes for Insulated-Gate Bipolar Transistor

Based on the construction of the 8-inch fabrication line, advanced process technology of 8-inch wafer, as well as the fourth-generation high-voltage double-diffused metal-oxide semiconductor (DMOS+) insulated-gate bipolar transistor (IGBT) technology and the fifth-generation trench gate IGBT technol...

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Veröffentlicht in:Engineering (Beijing, China) China), 2015-09, Vol.1 (3), p.361-366
Hauptverfasser: Liu, Guoyou, Ding, Rongjun, Luo, Haihui
Format: Artikel
Sprache:eng
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Zusammenfassung:Based on the construction of the 8-inch fabrication line, advanced process technology of 8-inch wafer, as well as the fourth-generation high-voltage double-diffused metal-oxide semiconductor (DMOS+) insulated-gate bipolar transistor (IGBT) technology and the fifth-generation trench gate IGBT technology, have been developed, realizing a great-leap forward technological development for the manufacturing of high-voltage IGBT from 6-inch to 8-inch. The 1600 A/1.7 kV and 1500 A/3.3 kV IGBT modules have been successfully fabricated, qualified, and applied in rail transportation traction system.
ISSN:2095-8099
DOI:10.15302/J-ENG-2015043