Electrical and optical properties of the WOx thin films, prepared by magnetron sputtering, and analysis of their highest value

In this article, optical and electrical properties of tungsten oxide thin films, prepared by magnetron sputtering in the atmosphere of various oxygen content, were analysed. Tungsten oxide is a material, which is widely used in modern applications such as smart windows, anti-steam mirrors, and gas sensors. Five sets of tungsten oxide thin films were deposited by magnetron sputtering in the mixed argon-oxygen atmosphere composed of various content of reactive gas, i.e., from 5% to 15%. In each case, other deposition process parameters were the same. The thickness of the thin films was ca. 160 nm and it was measured with the optical profilometer. It was noticed that along with the increase in the proportion of reactive gas in the process, thin film samples changed their colour from metallic, through navy blue to blue and simultaneously they became increasingly transparent. Measurements of electrical properties, made using the four-point probe and optical properties, performed with the aid of a spectrophotometer showed that increasing the proportion of oxygen in the process increased the average transmission in the visible wavelength range and the resistivity of the prepared WOx thin films. In the article, the Figure of Merit (FoM) coefficients are also presented, which determine the quality of the thin film samples. It was shown that the highest value of the FoM was observed for WOx thin film characterised by a relatively high average transmission in the visible wavelength range and low value of resistivity. The performed measurements showed that the gas atmosphere during magnetron sputtering process leads to the tailoring of the optical and electrical properties of tungsten oxide thin films, which in turn makes it possible to design and apply such thin film coatings in transparent electronics. Keywords: magnetron sputtering, thin films, tungsten oxide, optical and electrical properties