Study of the kinetic behavior of mandelic acid oxidation by vanadium(V) in sulfuric acid medium: effect of CTAB presence

The mandelic acid oxidation by vanadium (V) in sulfuric acid medium was studied at 303 K. The reaction rate was determined spectrophotometrically by means of the formation of vanadium (IV) at 760 nm. The oxidation reaction showed first order dependence in terms of vanadium (V)The mandelic acid oxida...

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Veröffentlicht in:	Semina. Ciências exatas e tecnológicas 2006-02, Vol.27 (2), p.183-191
Hauptverfasser:	Rômulo Augusto Ando, Keiko Takashima, Eduardo Niehues
Format:	Artikel
Sprache:	eng
Schlagworte:	a-hidroxiácido Oxidação por vanádio(V)M Ácido mandélico
Online-Zugang:	Volltext
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Zusammenfassung:	The mandelic acid oxidation by vanadium (V) in sulfuric acid medium was studied at 303 K. The reaction rate was determined spectrophotometrically by means of the formation of vanadium (IV) at 760 nm. The oxidation reaction showed first order dependence in terms of vanadium (V)The mandelic acid oxidation by vanadium (V) in sulfuric acid medium was studied at 303 K. The reaction rate was determined spectrophotometrically by means of the formation of vanadium (IV) at 760 nm. The oxidation reaction showed first order dependence in terms of vanadium (V).
ISSN:	1676-5451 1679-0375