Gadolinium thin films as benchmark for magneto-caloric thin films

We report on the preparation of Gadolinium thin films by means of sputter deposition on Silicon Oxide wafers. A series of samples with different buffer layers and various substrate temperatures has been produced. The film on an amorphous Tantalum buffer deposited at 773 K shows the highest increase...

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Veröffentlicht in:AIP advances 2017-05, Vol.7 (5), p.056429-056429-5
Hauptverfasser: Helmich, Lars, Bartke, Marianne, Teichert, Niclas, Schleicher, Benjamin, Fähler, Sebastian, Hütten, Andreas
Format: Artikel
Sprache:eng
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Zusammenfassung:We report on the preparation of Gadolinium thin films by means of sputter deposition on Silicon Oxide wafers. A series of samples with different buffer layers and various substrate temperatures has been produced. The film on an amorphous Tantalum buffer deposited at 773 K shows the highest increase of magnetization during the phase transition at the Curie temperature. Further detailed analysis of the magnetic properties has been conducted by VSM.
ISSN:2158-3226
2158-3226
DOI:10.1063/1.4977880