Semi insulating N-gallium nitride (GaN) on sapphire surface reflection dataset obtained at millimeter wave frequencies 107.35–165 GHz

A systematic collection of voltage reflection data for semi-insulating N-GaN wafer surface along with the reference reflection voltages are accomplished using a very stable continuous wave (CW) frequency stable probe source. The 2″ diameter direct-bandgap 5 µm silicon doped 105 Ω-cm GaN on 434 µm sa...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:Data in brief 2020-12, Vol.33, p.106419-106419, Article 106419
Hauptverfasser: Roy, Biswadev, Wu, Marvin H., Vlahovic, Branislav
Format: Artikel
Sprache:eng
Schlagworte:
Online-Zugang:Volltext
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:A systematic collection of voltage reflection data for semi-insulating N-GaN wafer surface along with the reference reflection voltages are accomplished using a very stable continuous wave (CW) frequency stable probe source. The 2″ diameter direct-bandgap 5 µm silicon doped 105 Ω-cm GaN on 434 µm sapphire is a commercial sample and was mounted in the path of collimated BWO generated millimeter wave beam with spot size ∼3 mm and rotated 64.5° to millimeter wave reflected energy into an antenna fed zero-bias Schottky barrier diode (ZBD), a negative polarity detector with responsivity 3.6 V/mW. Data obtained pertain to photon energies between 400 and 700 µeV (107.35–165 GHz). Data contains the 30-sample average and respective standard deviations for reference (mirror) and N-GaN reflected voltages. Anomalies in d.c. reflection coefficients (based on the raw data) are identified for users.
ISSN:2352-3409
2352-3409
DOI:10.1016/j.dib.2020.106419