Semi insulating N-gallium nitride (GaN) on sapphire surface reflection dataset obtained at millimeter wave frequencies 107.35–165 GHz
A systematic collection of voltage reflection data for semi-insulating N-GaN wafer surface along with the reference reflection voltages are accomplished using a very stable continuous wave (CW) frequency stable probe source. The 2″ diameter direct-bandgap 5 µm silicon doped 105 Ω-cm GaN on 434 µm sa...
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Veröffentlicht in: | Data in brief 2020-12, Vol.33, p.106419-106419, Article 106419 |
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Format: | Artikel |
Sprache: | eng |
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Zusammenfassung: | A systematic collection of voltage reflection data for semi-insulating N-GaN wafer surface along with the reference reflection voltages are accomplished using a very stable continuous wave (CW) frequency stable probe source. The 2″ diameter direct-bandgap 5 µm silicon doped 105 Ω-cm GaN on 434 µm sapphire is a commercial sample and was mounted in the path of collimated BWO generated millimeter wave beam with spot size ∼3 mm and rotated 64.5° to millimeter wave reflected energy into an antenna fed zero-bias Schottky barrier diode (ZBD), a negative polarity detector with responsivity 3.6 V/mW. Data obtained pertain to photon energies between 400 and 700 µeV (107.35–165 GHz). Data contains the 30-sample average and respective standard deviations for reference (mirror) and N-GaN reflected voltages. Anomalies in d.c. reflection coefficients (based on the raw data) are identified for users. |
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ISSN: | 2352-3409 2352-3409 |
DOI: | 10.1016/j.dib.2020.106419 |