DNA damage repair factor Rad18 controls virulence partially via transcriptional suppression of genes HWP1 and ECE1 in Candida albicans
DNA damage repair is a crucial cellular mechanism for rectifying DNA lesions arising during growth and development. Among the various repair pathways, postreplication repair (PRR) plays a pivotal role in resolving single-stranded gaps induced by DNA damage. However, the contribution of PRR to virule...
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Veröffentlicht in: | Virulence 2024-12, Vol.15 (1), p.2433201 |
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Zusammenfassung: | DNA damage repair is a crucial cellular mechanism for rectifying DNA lesions arising during growth and development. Among the various repair pathways, postreplication repair (PRR) plays a pivotal role in resolving single-stranded gaps induced by DNA damage. However, the contribution of PRR to virulence remains elusive in the fungal pathogen
. In this study, we investigated the role of Rad18, a critical component of PRR, in DNA damage response and virulence in
. We observed that deletion of
in
resulted in heightened sensitivity to DNA damage stress. Through deletion of specific internal domains coupled with spot assay analysis, we show that the internal RING and SAP domains play essential roles in DNA damage response, whereas the ZNF domain was less important. Surprisingly, the lack of Rad18 in
resulted in heightened intracellular survival within macrophages and elevated virulence in the
model. RNAseq analysis revealed that loss of Rad18 upregulated the transcription of genes encoding transporters and oxidoreductases, as well as virulence genes, including
and
. Suppression of the transcription of these virulence genes in the
deletion strain by a dCas9-mediated CRISPRi system reversed this increased virulence. Taken together, these data demonstrate that Rad18 plays a significant role in virulence partially through transcriptional suppression of virulence genes
and
in
. Our findings provide valuable insights into the intricate relationship between DNA damage response and virulence in
. |
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ISSN: | 2150-5594 2150-5608 2150-5608 |
DOI: | 10.1080/21505594.2024.2433201 |