Hafnium Oxide Nanostructured Thin Films: Electrophoretic Deposition Process and DUV Photolithography Patterning

Hafnium Oxide Nanostructured Thin Films: Electrophoretic Deposition Process and DUV Photolithography Patterning

In the frame of the nanoarchitectonic concept, the objective of this study was to develop simple and easy methods to ensure the preparation of polymorphic HfO2 thin film materials (

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Veröffentlicht in:Nanomaterials (Basel, Switzerland) Switzerland), 2022-07, Vol.12 (14), p.2334
Hauptverfasser: Proust, Vanessa, Kirscher, Quentin, Nguyen, Thi Kim Ngan, Obringer, Lisa, Ishii, Kento, Rault, Ludivine, Demange, Valérie, Berthebaud, David, Ohashi, Naoki, Uchikoshi, Tetsuo, Berling, Dominique, Soppera, Olivier, Grasset, Fabien
Format: Artikel
Sprache:eng
Schlagworte:
Aging
Chemical Sciences
Electron microscopy
Electrophoretic deposition
Ethanol
Glass substrates
Hafnium
Hafnium oxide
hydrothermal
Indium tin oxides
Micropatterning
Microscopy
Monoclinic lattice
Morphology
nanoarchitectonic
Nanoparticles
Nanostructure
Nanotechnology
Optical properties
Photolithography
Radiation
Reaction time
Scanning electron microscopy
Sol-gel processes
Spectrophotometry
Spin coating
Stability
Thin films
Transmission electron microscopy
X-ray diffraction
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Beschreibung
Zusammenfassung:In the frame of the nanoarchitectonic concept, the objective of this study was to develop simple and easy methods to ensure the preparation of polymorphic HfO2 thin film materials (
ISSN:2079-4991
2079-4991
DOI:10.3390/nano12142334