Improved route to a diphenoxide-based precursor for chemical vapour deposition of parylene AF-4

In this work, we present the synthesis of an alternative precursor for chemical vapour deposition of parylene AF-4 to the widely used standard, octafluoro[2.2]paracyclophane. The standard precursor suffers from uncertainties in its supply chain and its synthesis is of low yield. A comparison between...

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Veröffentlicht in:Royal Society open science 2021-04, Vol.8 (4), p.201921-201921, Article 201921
Hauptverfasser: Kast, Daniel, Franz, Gerhard, Senkevich, Jay J
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Sprache:eng
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Zusammenfassung:In this work, we present the synthesis of an alternative precursor for chemical vapour deposition of parylene AF-4 to the widely used standard, octafluoro[2.2]paracyclophane. The standard precursor suffers from uncertainties in its supply chain and its synthesis is of low yield. A comparison between different reaction parameters and solvents is drawn by means of thermal, laboratory-scale and microwave-assisted reactions and quantitative nuclear magnetic resonance (qNMR) studies.
ISSN:2054-5703
2054-5703
DOI:10.1098/rsos.201921