A New Approach for the Control and Reduction of Warpage and Residual Stresses in Bonded Wafer

A geometrical modification on silicon wafers before the bonding process, aimed to decrease (1) the residual stress caused by glass frit bonding, is proposed. Finite element modeling showed that (2) by introducing this modification, the wafer out-of-plane deflection was decreased by 34%. Moreover, (3...

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Veröffentlicht in:Micromachines (Basel) 2021-03, Vol.12 (4), p.361
Hauptverfasser: Farshchi Yazdi, Seyed Amir Fouad, Garavaglia, Matteo, Ghisi, Aldo, Corigliano, Alberto
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Sprache:eng
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Zusammenfassung:A geometrical modification on silicon wafers before the bonding process, aimed to decrease (1) the residual stress caused by glass frit bonding, is proposed. Finite element modeling showed that (2) by introducing this modification, the wafer out-of-plane deflection was decreased by 34%. Moreover, (3) fabricated wafers with the proposed geometrical feature demonstrated an improvement for the (4) warpage with respect to the plain wafers. A benefit for curvature variation and overall shape of the (5) bonded wafers was also observed.
ISSN:2072-666X
2072-666X
DOI:10.3390/mi12040361