Optical In-Process Measurement: Concepts for Precise, Fast and Robust Optical Metrology for Complex Measurement Situations
Optical metrology is a key element for many areas of modern production. Preferably, measurements should take place within the production line (in-process) and keep pace with production speed, even if the parts have a complex geometry or are difficult to access. The challenge for modern optical in-pr...
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Veröffentlicht in: | Applied sciences 2021-11, Vol.11 (22), p.10533 |
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Zusammenfassung: | Optical metrology is a key element for many areas of modern production. Preferably, measurements should take place within the production line (in-process) and keep pace with production speed, even if the parts have a complex geometry or are difficult to access. The challenge for modern optical in-process measurements is, therefore, how to simultaneously make optical metrology precise, fast, robust and capable of handling geometrical complexity. The potential of individual techniques to achieve these demands can be visualized by the tetrahedron of optical metrology. Depending on the application, techniques based on interferometry or geometrical optics may have to be preferred. The paper emphasizes complexity and robustness as prime areas of improvement. Concerning interferometric techniques, we report on fast acquisition as used in holography, tailoring of coherence properties and use of Multiple simultaneous Viewing direction holography (MultiView), self reference used in Computational Shear Interferometry (CoSI) and the simultaneous use of several light sources in Multiple Aperture Shear Interferometry (MArS) based on CoSI as these techniques have proven to be particularly effective. The use of advanced approaches based on CoSI requires a transition of the description of light from the use of the well-known wave field to the coherence function of light. Techniques based on geometric optics are generally comparatively robust against environmental disturbances, and Fringe Projection (FP) is shown to be especially useful in very demanding measurement conditions. |
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ISSN: | 2076-3417 2076-3417 |
DOI: | 10.3390/app112210533 |