Application of Ellipsometry to Control the Plasmachemical Synthesis of Thin TiONx Layers

Ellipsometry is often used to determine the characteristics of films. Ellipsometric studies may turn out to be ineffective because several solutions correspond to the same polarization angles. It is demonstrated that the ambiguity is not due to the physical limitations of the method but it has a pur...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:Advances in Condensed Matter Physics 2015-01, Vol.2015 (2015), p.703-710
Hauptverfasser: Dultsev, F. N., Kolosovsky, E. A.
Format: Artikel
Sprache:eng
Schlagworte:
Online-Zugang:Volltext
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:Ellipsometry is often used to determine the characteristics of films. Ellipsometric studies may turn out to be ineffective because several solutions correspond to the same polarization angles. It is demonstrated that the ambiguity is not due to the physical limitations of the method but it has a purely mathematical character. So, additional information about the film is necessary to determine the absolute values of refractive index, attenuation, and thickness.
ISSN:1687-8108
1687-8124
DOI:10.1155/2015/709308