Resistive Switching of Sub-10 nm TiO₂ Nanoparticle Self-Assembled Monolayers

Resistively switching devices are promising candidates for the next generation of non-volatile data memories. Such devices are up to now fabricated mainly by means of top-down approaches that apply thin films sandwiched between electrodes. Recent works have demonstrated that resistive switching (RS)...

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Veröffentlicht in:Nanomaterials (Basel, Switzerland) Switzerland), 2017-11, Vol.7 (11), p.370
Hauptverfasser: Schmidt, Dirk Oliver, Raab, Nicolas, Noyong, Michael, Santhanam, Venugopal, Dittmann, Regina, Simon, Ulrich
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Sprache:eng
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Zusammenfassung:Resistively switching devices are promising candidates for the next generation of non-volatile data memories. Such devices are up to now fabricated mainly by means of top-down approaches that apply thin films sandwiched between electrodes. Recent works have demonstrated that resistive switching (RS) is also feasible on chemically synthesized nanoparticles (NPs) in the 50 nm range. Following this concept, we developed this approach further to the sub-10 nm range. In this work, we report RS of sub-10 nm TiO₂ NPs that were self-assembled into monolayers and transferred onto metallic substrates. We electrically characterized these monolayers in regard to their RS properties by means of a nanorobotics system in a scanning electron microscope, and found features typical of bipolar resistive switching.
ISSN:2079-4991
2079-4991
DOI:10.3390/nano7110370