Engineering new limits to magnetostriction through metastability in iron-gallium alloys
Magnetostrictive materials transduce magnetic and mechanical energies and when combined with piezoelectric elements, evoke magnetoelectric transduction for high-sensitivity magnetic field sensors and energy-efficient beyond-CMOS technologies. The dearth of ductile, rare-earth-free materials with hig...
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Veröffentlicht in: | Nature communications 2021-05, Vol.12 (1), p.2757-2757, Article 2757 |
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Format: | Artikel |
Sprache: | eng |
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Zusammenfassung: | Magnetostrictive materials transduce magnetic and mechanical energies and when combined with piezoelectric elements, evoke magnetoelectric transduction for high-sensitivity magnetic field sensors and energy-efficient beyond-CMOS technologies. The dearth of ductile, rare-earth-free materials with high magnetostrictive coefficients motivates the discovery of superior materials. Fe
1−
x
Ga
x
alloys are amongst the highest performing rare-earth-free magnetostrictive materials; however, magnetostriction becomes sharply suppressed beyond
x
= 19% due to the formation of a parasitic ordered intermetallic phase. Here, we harness epitaxy to extend the stability of the BCC Fe
1−
x
Ga
x
alloy to gallium compositions as high as
x
= 30% and in so doing dramatically boost the magnetostriction by as much as 10x relative to the bulk and 2x larger than canonical rare-earth based magnetostrictors. A Fe
1−
x
Ga
x
− [Pb(Mg
1/3
Nb
2/3
)O
3
]
0.7
−[PbTiO
3
]
0.3
(PMN-PT) composite magnetoelectric shows robust 90° electrical switching of magnetic anisotropy and a converse magnetoelectric coefficient of 2.0 × 10
−5
s m
−1
. When optimally scaled, this high coefficient implies stable switching at ~80 aJ per bit.
In this work, Meisenheimer et al. use careful epitaxial growth of FeGa thin films to achieve a metastable state with remarkably high magetostrictive coefficients. Materials with strong magnetostrictive properties are vital components in magnetoelectric multiferroic heterostructures, with considerable potential for use a variety of technologies. |
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ISSN: | 2041-1723 2041-1723 |
DOI: | 10.1038/s41467-021-22793-x |