Electrochemical deposition of iron sulfide thin films and heterojunction diodes with zinc oxide

Iron sulfide thin films were fabricated by the electrochemical deposition method from an aqueous solution containing FeSO4 and Na2S2O3. The composition ratio obtained was Fe:S:O = 36:56:8. In the photoelectrochemical measurement, a weak negative photo-current was observed for the iron sulfide films,...

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Veröffentlicht in:APL materials 2014-03, Vol.2 (3), p.032110-032110-5
Hauptverfasser: Kawai, Shoichi, Yamazaki, Ryuta, Sobue, Susumu, Okuno, Eiichi, Ichimura, Masaya
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Sprache:eng
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Zusammenfassung:Iron sulfide thin films were fabricated by the electrochemical deposition method from an aqueous solution containing FeSO4 and Na2S2O3. The composition ratio obtained was Fe:S:O = 36:56:8. In the photoelectrochemical measurement, a weak negative photo-current was observed for the iron sulfide films, which indicates that its conduction type is p-type. No peaks were observed in X-ray diffraction pattern, and thus the deposited films were considered to be amorphous. For a heterojunction with ZnO, rectification properties were confirmed in the current-voltage characteristics. Moreover, the current was clearly enhanced under AM1.5 illumination.
ISSN:2166-532X
2166-532X
DOI:10.1063/1.4869035