Deposition of thin film of titanium on ceramic substrate using the discharge for hollow cathode for Al2O3/Al2O3 indirect brazing

Thin films of titanium were deposited onto an Al2O3 substrate by the hollow cathode discharge method for the formation of a ceramic-ceramic joint using the indirect brazing method. An advantage of using this technique was that a relatively small amount of titanium was required for the metallisation of the ceramic surface when compared with other conventional methods. A rapidly solidified brazing filler of Cu49Ag45Ce6 in the form of ribbons was used. The thickness of the deposited titanium layer and the brazing temperature/time were varied. The quality of the brazed joint was evaluated by the three-point bending tests. The brazed joints had high flexural resistance values up to 176 MPa showing the efficiency of the technique.