A high entropy silicide by reactive spark plasma sintering

A high-entropy silicide (HES), (Ti 0.2 Zr 0.2 Nb 0.2 Mo 0.2 W 0.2 )Si 2 with close-packed hexagonal structure is successfully manufactured through reactive spark plasma sintering at 1300 °C for 15 min. The elements in this HES are uniformly distributed in the specimen based on the energy dispersive...

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Veröffentlicht in:	Journal of advanced ceramics 2019-03, Vol.8 (1), p.148-152
Hauptverfasser:	Qin, Yuan, Liu, Ji-Xuan, Li, Fei, Wei, Xiaofeng, Wu, Houzheng, Zhang, Guo-Jun
Format:	Artikel
Sprache:	eng
Schlagworte:	Ceramics Characterization and Evaluation of Materials Chemistry and Materials Science Composites Diamond pyramid hardness Electrical conductivity Glass Hardness (Materials) Heating equipment high-entropy ceramics high-entropy silicide Integrated circuits Intermetallic compounds Materials Science Modulus of elasticity Molybdenum Nanotechnology Natural Materials Oxidation-reduction reactions Plasma sintering Poisson's ratio Rapid Communication silicide Silicides Silicon compounds Sintering Spark plasma sintering Specialty metals industry Structural Materials Thermal conductivity Zirconium
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Beschreibung
Zusammenfassung:	A high-entropy silicide (HES), (Ti 0.2 Zr 0.2 Nb 0.2 Mo 0.2 W 0.2 )Si 2 with close-packed hexagonal structure is successfully manufactured through reactive spark plasma sintering at 1300 °C for 15 min. The elements in this HES are uniformly distributed in the specimen based on the energy dispersive spectrometer analysis except a small amount of zirconium that is combined with oxygen as impurity particles. The Young’s modulus, Poisson’s ratio, and Vickers hardness of the obtained (Ti 0.2 Zr 0.2 Nb 0.2 Mo 0.2 W 0.2 )Si 2 are also measured.
ISSN:	2226-4108 2227-8508
DOI:	10.1007/s40145-019-0319-3