Versatile fabrication method for multiscale hierarchical structured polymer masters using a combination of photo- and nanoimprint lithography

We present a versatile and scalable method for the preparation of microfluidic channels with incorporated nano patterns. Since our approach is highly industrial driven, all used methods and materials are available in common micro-fabrication environment and are available in large quantities, respectively. In comparison to other fabrication methods capable of realizing multi-level patterns, we combine nanoimprint lithography with standard photolithography, and thereby overcome the problems of limited pattern dimensions as well as fabrication time, pathing the way for a new class of microfluidic devices. [Display omitted] •High aspect ratio (AR = 11) fabrication of polymer masters using negative photoresists•Combinatorial approach for the fabrication of 2.5D scaffolds with micron and nano pattern•Combination of nanoimprint lithography and photolithography for fast prototyping•Optimized replication via soft-UV NIL using highly compatible resists and stamp materials