Special Issue “ALD Technique for Functional Coatings of Nanostructured Materials”

Atomic layer deposition (ALD) is a vapor-phase technique that consists of the alternation of separated self-limiting surface reactions, which enable film thickness to be accurately controlled at the angstrom level, based on the former atomic layer epitaxy method [...]

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Bibliographische Detailangaben
Veröffentlicht in:Nanomaterials (Basel, Switzerland) Switzerland), 2022-10, Vol.12 (19), p.3489
Hauptverfasser: Fernández, Javier Garcia, Martínez, Victor Vega, de la Prida Pidal, Victor Manuel
Format: Artikel
Sprache:eng
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Zusammenfassung:Atomic layer deposition (ALD) is a vapor-phase technique that consists of the alternation of separated self-limiting surface reactions, which enable film thickness to be accurately controlled at the angstrom level, based on the former atomic layer epitaxy method [...]
ISSN:2079-4991
2079-4991
DOI:10.3390/nano12193489