Special Issue “ALD Technique for Functional Coatings of Nanostructured Materials”
Atomic layer deposition (ALD) is a vapor-phase technique that consists of the alternation of separated self-limiting surface reactions, which enable film thickness to be accurately controlled at the angstrom level, based on the former atomic layer epitaxy method [...]
Gespeichert in:
Veröffentlicht in: | Nanomaterials (Basel, Switzerland) Switzerland), 2022-10, Vol.12 (19), p.3489 |
---|---|
Hauptverfasser: | , , |
Format: | Artikel |
Sprache: | eng |
Schlagworte: | |
Online-Zugang: | Volltext |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
Zusammenfassung: | Atomic layer deposition (ALD) is a vapor-phase technique that consists of the alternation of separated self-limiting surface reactions, which enable film thickness to be accurately controlled at the angstrom level, based on the former atomic layer epitaxy method [...] |
---|---|
ISSN: | 2079-4991 2079-4991 |
DOI: | 10.3390/nano12193489 |