Universal light-guiding geometry for on-chip resonators having extremely high Q-factor

By providing an effective way to leverage nonlinear phenomena in integrated devices, high-Q optical resonators have led to recent advances in on-chip photonics. However, developing fabrication processes to shape any new material into a resonator with extremely smooth surfaces on a chip has been an e...

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Veröffentlicht in:Nature communications 2020-11, Vol.11 (1), p.5933-5933, Article 5933
Hauptverfasser: Kim, Dae-Gon, Han, Sangyoon, Hwang, Joonhyuk, Do, In Hwan, Jeong, Dongin, Lim, Ji-Hun, Lee, Yong-Hoon, Choi, Muhan, Lee, Yong-Hee, Choi, Duk-Yong, Lee, Hansuek
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Sprache:eng
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Zusammenfassung:By providing an effective way to leverage nonlinear phenomena in integrated devices, high-Q optical resonators have led to recent advances in on-chip photonics. However, developing fabrication processes to shape any new material into a resonator with extremely smooth surfaces on a chip has been an exceptionally challenging task. Here, we describe a universal method to implement ultra-high-Q resonators with any new material having desirable properties that can be deposited by physical vapor deposition. Using this method light-guiding cores with surface roughness on the molecular-scale are created automatically on pre-patterned substrates. Its efficacy has been verified using As 2 S 3 , a chalcogenide glass that has high-nonlinearity. The Q-factor of the As 2 S 3 resonator so-developed approached the propagation loss record achieved in chalcogenide fibers which were limited by material losses. Owing to the boosted Q-factor, lasing by stimulated Brillouin scattering has been demonstrated with 100 times lower threshold power than the previous record. High-Q resonators are used to enhance nonlinear phenomena in photonics, but developing a fabrication process to shape a new material into a resonator is challenging and costly. Here, the authors present a method using vapour deposition on pre-patterned substrates to fabricate resonators with any new material.
ISSN:2041-1723
2041-1723
DOI:10.1038/s41467-020-19799-2