Electrical Properties of Amorphous Titanium Oxide Thin Films for Bolometric Application

We report the electrical conduction mechanism of amorphous titanium oxide thin films applied for bolometers. As the O/Ti ratio varies from 1.73 to 1.97 measured by rutherford backscattering spectroscopy, the resistivity of the films increases from 0.26 Ω cm to 10.1 Ω cm. At the same time, the temper...

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Veröffentlicht in:Advances in Condensed Matter Physics 2013-01, Vol.2013 (2013), p.190-194
Hauptverfasser: Ju, Yongfeng, Wang, Mahua, Wang, Yunlong, Wang, Shihu, Fu, Chengfang
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Sprache:eng
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Zusammenfassung:We report the electrical conduction mechanism of amorphous titanium oxide thin films applied for bolometers. As the O/Ti ratio varies from 1.73 to 1.97 measured by rutherford backscattering spectroscopy, the resistivity of the films increases from 0.26 Ω cm to 10.1 Ω cm. At the same time, the temperature coefficient of resistivity and activation energy vary from −1.2% to −2.3% and from 0.09 eV to 0.18 eV, respectively. The temperature dependence of the electrical conductivity illustrates a thermally activated conduction behavior and the carrier transport mechanism in the titanium oxide thin films is found to obey the normal Meyer-Neldel Rule in the temperature range from 293 K to 373 K.
ISSN:1687-8108
1687-8124
DOI:10.1155/2013/365475