Electrical Properties of Amorphous Titanium Oxide Thin Films for Bolometric Application
We report the electrical conduction mechanism of amorphous titanium oxide thin films applied for bolometers. As the O/Ti ratio varies from 1.73 to 1.97 measured by rutherford backscattering spectroscopy, the resistivity of the films increases from 0.26 Ω cm to 10.1 Ω cm. At the same time, the temper...
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Veröffentlicht in: | Advances in Condensed Matter Physics 2013-01, Vol.2013 (2013), p.190-194 |
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Format: | Artikel |
Sprache: | eng |
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Zusammenfassung: | We report the electrical conduction mechanism of amorphous titanium oxide thin films applied for bolometers. As the O/Ti ratio varies from 1.73 to 1.97 measured by rutherford backscattering spectroscopy, the resistivity of the films increases from 0.26 Ω cm to 10.1 Ω cm. At the same time, the temperature coefficient of resistivity and activation energy vary from −1.2% to −2.3% and from 0.09 eV to 0.18 eV, respectively. The temperature dependence of the electrical conductivity illustrates a thermally activated conduction behavior and the carrier transport mechanism in the titanium oxide thin films is found to obey the normal Meyer-Neldel Rule in the temperature range from 293 K to 373 K. |
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ISSN: | 1687-8108 1687-8124 |
DOI: | 10.1155/2013/365475 |