Detectors Array for In Situ Electron Beam Imaging by 16-nm FinFET CMOS Technology

A novel in situ imaging solution and detectors array for the focused electron beam (e-beam) are the first time proposed and demonstrated. The proposed in-tool, on-wafer e-beam detectors array features full FinFET CMOS logic compatibility, compact 2 T pixel structure, fast response, high responsivity...

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Veröffentlicht in:Nanoscale research letters 2021-05, Vol.16 (1), p.93-93, Article 93
Hauptverfasser: Wang, Chien-Ping, Lin, Burn Jeng, Shih, Jiaw-Ren, Chih, Yue-Der, Chang, Jonathan, Lin, Chrong Jung, King, Ya-Chin
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Sprache:eng
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Zusammenfassung:A novel in situ imaging solution and detectors array for the focused electron beam (e-beam) are the first time proposed and demonstrated. The proposed in-tool, on-wafer e-beam detectors array features full FinFET CMOS logic compatibility, compact 2 T pixel structure, fast response, high responsivity, and wide dynamic range. The e-beam imaging pattern and detection results can be further stored in the sensing/storage node without external power supply, enabling off-line electrical reading, which can be used to rapidly provide timely feedback of the key parameters of the e-beam on the projected wafers, including dosage, accelerating energy, and intensity distributions.
ISSN:1931-7573
1556-276X
1556-276X
DOI:10.1186/s11671-021-03552-9