A Review: Preparation, Performance, and Applications of Silicon Oxynitride Film

Silicon oxynitride (SiN O ) is a highly promising functional material for its luminescence performance and tunable refractive index, which has wide applications in optical devices, non-volatile memory, barrier layer, and scratch-resistant coatings. This review presents recent developments, and discu...

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Veröffentlicht in:	Micromachines (Basel) 2019-08, Vol.10 (8), p.552
Hauptverfasser:	Shi, Yue, He, Liang, Guang, Fangcao, Li, Luhai, Xin, Zhiqing, Liu, Ruping
Format:	Artikel
Sprache:	eng
Schlagworte:	Annealing Barrier layers Chemical vapor deposition Functional materials Memory devices Nitrogen Optical memory (data storage) Organic light emitting diodes photoluminescence Physical vapor deposition Quantum dots Radiation Refractivity Review Scratch resistance Silicon nitride Silicon oxynitride thin film Thin films
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Beschreibung
Zusammenfassung:	Silicon oxynitride (SiN O ) is a highly promising functional material for its luminescence performance and tunable refractive index, which has wide applications in optical devices, non-volatile memory, barrier layer, and scratch-resistant coatings. This review presents recent developments, and discusses the preparation methods, performance, and applications of SiN O film. In particular, the preparation of SiN O film by chemical vapor deposition, physical vapor deposition, and oxynitridation is elaborated in details.
ISSN:	2072-666X 2072-666X
DOI:	10.3390/mi10080552