The Re-validation of the Logistic Diffusion Model Applying for the Growing Pattern of Patent Forward Citations
[Purpose/significance] The patent citation is a kind of behavior that can reveal the pattern of technology diffusion. It is an important research tool to infer the technology diffusion behavior by using the patent forward citations. [Method/process] In this study, we fit the cumulative forward citat...
Gespeichert in:
Veröffentlicht in: | Zhishi guanli luntan 2017-03, Vol.2 (2), p.110-119 |
---|---|
Hauptverfasser: | , , , |
Format: | Artikel |
Sprache: | chi |
Schlagworte: | |
Online-Zugang: | Volltext |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
Zusammenfassung: | [Purpose/significance] The patent citation is a kind of behavior that can reveal the pattern of technology diffusion. It is an important research tool to infer the technology diffusion behavior by using the patent forward citations. [Method/process] In this study, we fit the cumulative forward citations to the Logistic model again for Graphene sensor with the optimized experiment method. We analyzed and discussed the differences of the methods and results with the previous two studies, which were held by Hosein Fallah and Elliot Fishman in 2009 and Zhang Xiaoqiang et al. in 2014. [Result/conclusion]It is re-verified that the patent forward citations infer the model of technology diffusion. And a further hypothesis based on the previous studies that the pattern of the forward citations of all the patents within a certain technical field follows the Logistic diffusion model is further confirmed. |
---|---|
ISSN: | 2095-5472 2095-5472 |
DOI: | 10.13266/j.issn.2095-5472.2017.012 |