Electronic Structure of the Metastable Epitaxial Rock-Salt SnSe { 111 } Topological Crystalline Insulator

Topological crystalline insulators have been recently predicted and observed in rock-salt structure SnSe {111} thin films. Previous studies have suggested that the Se-terminated surface of this thin film with hydrogen passivation has a reduced surface energy and is thus a preferred configuration. In...

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Veröffentlicht in:Physical review. X 2017-10, Vol.7 (4), p.041020, Article 041020
Hauptverfasser: Jin, Wencan, Vishwanath, Suresh, Liu, Jianpeng, Kong, Lingyuan, Lou, Rui, Dai, Zhongwei, Sadowski, Jerzy T., Liu, Xinyu, Lien, Huai-Hsun, Chaney, Alexander, Han, Yimo, Cao, Michael, Ma, Junzhang, Qian, Tian, Wang, Shancai, Dobrowolska, Malgorzata, Furdyna, Jacek, Muller, David A., Pohl, Karsten, Ding, Hong, Dadap, Jerry I., Xing, Huili Grace, Osgood, Richard M.
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Sprache:eng
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Zusammenfassung:Topological crystalline insulators have been recently predicted and observed in rock-salt structure SnSe {111} thin films. Previous studies have suggested that the Se-terminated surface of this thin film with hydrogen passivation has a reduced surface energy and is thus a preferred configuration. In this paper, synchrotron-based angle-resolved photoemission spectroscopy, along with density functional theory calculations, is used to demonstrate that a rock-salt SnSe {111} thin film epitaxially grown on Bi2Se3 has a stable Sn-terminated surface. These observations are supported by low-energy electron diffraction (LEED) intensity-voltage measurements and dynamical LEED calculations, which further show that the Sn-terminated SnSe {111} thin film has undergone a surface structural relaxation of the interlayer spacing between the Sn and Se atomic planes. In sharp contrast to the Se-terminated counterpart, the observed Dirac surface state in the Sn-terminated SnSe {111} thin film is shown to yield a high Fermi velocity, 0.50×106m/s , which suggests a potential mechanism of engineering the Dirac surface state of topological materials by tuning the surface configuration.
ISSN:2160-3308
2160-3308
DOI:10.1103/PhysRevX.7.041020