Deposition of TiO2 Film on Duplex Stainless Steel Substrate Using the Cathodic Cage Plasma Technique

This research used the "cathodic cage (CC)" technique for TiO2 film deposition on duplex stainless steel substrate. This technique uses a multiple hollow cathode effect. Duplex stainless steel substrates were treated at temperatures of 300°C, 350°C and 400°C, giving a temperature value ratio (Ts/Tm) of 0.27 to 0.31 (Ts being the substrate temperature and Tm the melting temperature of the deposited material). Treatment times of 1, 2 and 4 hours were administered and polycrystalline TiO2 films were obtained. The films were analyzed by optical microscopy (OM), X-ray diffraction (XRD), Raman spectroscopy and scanning electron microscopy (SEM). During analysis, the formation of uniform films and the possibility of controlling the TiO2 phase were observed. It was also shown that with longer treatment times and higher temperatures the rutile phase predominates. For treatment times of 4 hours at all temperatures, the rutile structure was present. With treatment times of less than 4 hours, anatase was present. In addition, results showed that this simple, low cost technique can be an alternative method for depositions of TiO2 films, with the advantage of high levels of control over porosity, thickness and phase composition (anatase and rutile).