A magnetically controlled chemical–mechanical polishing (MC‐CMP) approach for fabricating channel‐cut silicon crystal optics for the High Energy Photon Source

Crystal monochromators are indispensable optical components for the majority of beamlines at synchrotron radiation facilities. Channel‐cut monochromators are sometimes chosen to filter monochromatic X‐ray beams by virtue of their ultrahigh angular stability. Nevertheless, high‐accuracy polishing on the inner diffracting surfaces remains challenging, thus hampering their performance in preserving the coherence or wavefront of the photon beam. Herein, a magnetically controlled chemical–mechanical polishing (MC‐CMP) approach has been successfully developed for fine polishing of the inner surfaces of channel‐cut crystals. This MC‐CMP process relieves the constraints of narrow working space dictated by small offset requirements and achieves near‐perfect polishing on the surface of the crystals. Using this method, a high‐quality surface with roughness of 0.614 nm (root mean square, r.m.s.) is obtained in a channel‐cut crystal with 7 mm gap designed for beamlines at the High Energy Photon Source, a fourth‐generation synchrotron radiation source under construction. On‐line X‐ray topography and rocking‐curve measurements indicate that the stress residual layer on the crystal surface was removed. Firstly, the measured rocking‐curve width is in good agreement with the theoretical value. Secondly, the peak reflectivity is very close to theoretical values. Thirdly, topographic images of the optics after polishing were uniform without any speckle or scratches. Only a nearly 2.5 nm‐thick SiO2 layer was observed on the perfect crystalline matrix from high‐resolution transmission electron microscopy photographs, indicating that the structure of the bulk material is defect‐ and dislocation‐free. Future development of MC‐CMP is promising for fabricating wavefront‐preserving and ultra‐stable channel‐cut monochromators, which are crucial to exploit the merits of fourth‐generation synchrotron radiation sources or hard X‐ray free‐electron lasers. The novel magnetically controlled chemical–mechanical polishing technique features simplicity in mechanical components and compatibility with almost all kinds of surface shapes, and is able to fabricate high‐accuracy inner‐wall surfaces without damaging layers.