Aqueous double-layer paint of low thickness for sub-ambient radiative cooling
Radiative cooling may serve as a promising option to reduce energy consumption for space cooling. Radiative cooling paints provide a cost-effective and scalable solution for diverse applications and attract great attention, but the state-of-art cooling paints generally use non-eco-friendly organic s...
Gespeichert in:
Veröffentlicht in: | Nanophotonics (Berlin, Germany) Germany), 2024-03, Vol.13 (5), p.659-668 |
---|---|
Hauptverfasser: | , , , |
Format: | Artikel |
Sprache: | eng |
Schlagworte: | |
Online-Zugang: | Volltext |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
Zusammenfassung: | Radiative cooling may serve as a promising option to reduce energy consumption for space cooling. Radiative cooling paints provide a cost-effective and scalable solution for diverse applications and attract great attention, but the state-of-art cooling paints generally use non-eco-friendly organic solvents and need large thicknesses (>400 μm) to realize high performance, which leads to high cost and environmental issues in implementation. This work aims to address these challenges by developing eco-friendly aqueous paints with low thickness (below 150 μm) by adopting a double-layer design based on a complementary spectrum strategy. The structure consists of a wide bandgap top layer to scatter short-wavelength light and a bottom layer with high reflectance to visible and near-infrared (NIR) irradiation. Effects of different design factors are studied using numerical simulation and experiments to attain the optimal design. The resulting Y
–ZnO paints show a strong reflectance of 95.4 % and a high atmospheric window emissivity of 0.93 at a low thickness of 150 μm. Field tests in the subtropic humid climate of Hong Kong demonstrated sub-ambient cooling of 2 °C at noon and 4 °C at night without shielding convection. The paints also show high robustness and excellent resistance to water and UV light attacks, rendering them promising for large-scale applications. |
---|---|
ISSN: | 2192-8614 2192-8606 2192-8614 |
DOI: | 10.1515/nanoph-2023-0664 |