High-resolution combinatorial patterning of functional nanoparticles

Fast, low-cost, reliable, and multi-component nanopatterning techniques for functional colloidal nanoparticles have been dreamed about by scientists and engineers for decades. Although countless efforts have been made, it is still a daunting challenge to organize different nanocomponents into a pred...

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Veröffentlicht in:Nature communications 2020-11, Vol.11 (1), p.6002-6002, Article 6002
Hauptverfasser: Xing, Xing, Man, Zaiqin, Bian, Jie, Yin, Yadong, Zhang, Weihua, Lu, Zhenda
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Sprache:eng
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Zusammenfassung:Fast, low-cost, reliable, and multi-component nanopatterning techniques for functional colloidal nanoparticles have been dreamed about by scientists and engineers for decades. Although countless efforts have been made, it is still a daunting challenge to organize different nanocomponents into a predefined structure with nanometer precision over the millimeter and even larger scale. To meet the challenge, we report a nanoprinting technique that can print various functional colloidal nanoparticles into arbitrarily defined patterns with a 200 nm (or smaller) pitch (>125,000 DPI), 30 nm (or larger) pixel size/linewidth, 10 nm position accuracy and 50 nm overlay precision. The nanopatterning technique combines dielectrophoretic enrichment and deep surface-energy modulation and therefore features high efficiency and robustness. It can form nanostructures over the millimeter-scale by simply spinning, brushing or dip coating colloidal nanoink onto a substrate with minimum error (error ratio < 2 × 10 −6 ). This technique provides a powerful yet simple construction tool for large-scale positioning and integration of multiple functional nanoparticles toward next-generation optoelectronic and biomedical devices. Precise patterning of functional nanoparticles can provide a powerful tool for next-generation macroscale devices. Here, the authors report a reliable nanoprinting technique that can pattern various functional nanoparticles on the substrate with a 200 nm pitch and 10 nm position accuracy, and above the millimeter scale.
ISSN:2041-1723
2041-1723
DOI:10.1038/s41467-020-19771-0