Enhanced spin–orbit coupling in core/shell nanowires

The spin–orbit coupling (SOC) in semiconductors is strongly influenced by structural asymmetries, as prominently observed in bulk crystal structures that lack inversion symmetry. Here we study an additional effect on the SOC: the asymmetry induced by the large interface area between a nanowire core...

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Veröffentlicht in:Nature communications 2016-08, Vol.7 (1), p.12413-12413, Article 12413
Hauptverfasser: Furthmeier, Stephan, Dirnberger, Florian, Gmitra, Martin, Bayer, Andreas, Forsch, Moritz, Hubmann, Joachim, Schüller, Christian, Reiger, Elisabeth, Fabian, Jaroslav, Korn, Tobias, Bougeard, Dominique
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Sprache:eng
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Zusammenfassung:The spin–orbit coupling (SOC) in semiconductors is strongly influenced by structural asymmetries, as prominently observed in bulk crystal structures that lack inversion symmetry. Here we study an additional effect on the SOC: the asymmetry induced by the large interface area between a nanowire core and its surrounding shell. Our experiments on purely wurtzite GaAs/AlGaAs core/shell nanowires demonstrate optical spin injection into a single free-standing nanowire and determine the effective electron g -factor of the hexagonal GaAs wurtzite phase. The spin relaxation is highly anisotropic in time-resolved micro-photoluminescence measurements on single nanowires, showing a significant increase of spin relaxation in external magnetic fields. This behaviour is counterintuitive compared with bulk wurtzite crystals. We present a model for the observed electron spin dynamics highlighting the dominant role of the interface-induced SOC in these core/shell nanowires. This enhanced SOC may represent an interesting tuning parameter for the implementation of spin–orbitronic concepts in semiconductor-based structures. Spin-orbit coupling underlies many important spintronic concepts, and is strongly influenced by crystal symmetry. Here, the authors demonstrate a strong enhancement of spin-orbit coupling in core/shell semiconductor nanowires induced by the large interfacial surface areas
ISSN:2041-1723
2041-1723
DOI:10.1038/ncomms12413