Sample-efficient parameter exploration of the powder film drying process using experiment-based Bayesian optimization
Parameter optimization is a long-standing challenge in various production processes. Particularly, powder film forming processes entail multiscale and multiphysical phenomena, each of which is usually controlled by a combination of several parameters. Therefore, it is difficult to optimize the param...
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Veröffentlicht in: | Scientific reports 2022-02, Vol.12 (1), p.1615-1615, Article 1615 |
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Sprache: | eng |
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Zusammenfassung: | Parameter optimization is a long-standing challenge in various production processes. Particularly, powder film forming processes entail multiscale and multiphysical phenomena, each of which is usually controlled by a combination of several parameters. Therefore, it is difficult to optimize the parameters either by numerical-model-based analysis or by “brute force” experiment-based exploration. In this study, we focus on a Bayesian optimization method that has led to breakthroughs in materials informatics. Specifically, we apply this method to exploration of production-process-parameter for the powder film forming process. To this end, a slurry containing a powder, polymer, and solvent was dropped, the drying temperature and time were controlled as parameters to be explored, and the uniformity of the fabricated film was evaluated. Using this experiment-based Bayesian optimization system, we searched for the optimal parameters among 32,768 (8
5
) parameter sets to minimize defects. This optimization converged at 40 experiments, which is a substantially smaller number than that observed in brute-force exploration and traditional design-of-experiments methods. Furthermore, we inferred the mechanism corresponding to the unknown drying conditions discovered in the parameter exploration that resulted in uniform film formation. This demonstrates that a data-driven approach leads to high-throughput exploration and the discovery of novel parameters, which inspire further research. |
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ISSN: | 2045-2322 2045-2322 |
DOI: | 10.1038/s41598-022-05784-w |