Design and Fabrication of Interdigital Nanocapacitors Coated with HfO2

In this article nickel interdigital capacitors were fabricated on top of silicon substrates. The capacitance of the interdigital capacitor was optimized by coating the electrodes with a 60 nm layer of HfO2. An analytical solution of the capacitance was compared to electromagnetic simulations using C...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:Sensors (Basel, Switzerland) Switzerland), 2015-01, Vol.15 (1), p.1998-2005
Hauptverfasser: González, Gabriel, Kolosovas-Machuca, Eleazar Samuel, López-Luna, Edgar, Hernández-Arriaga, Heber, González, Francisco Javier
Format: Artikel
Sprache:eng
Schlagworte:
Online-Zugang:Volltext
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:In this article nickel interdigital capacitors were fabricated on top of silicon substrates. The capacitance of the interdigital capacitor was optimized by coating the electrodes with a 60 nm layer of HfO2. An analytical solution of the capacitance was compared to electromagnetic simulations using COMSOL and with experimental measurements. Results show that modeling interdigital capacitors using Finite Element Method software such as COMSOL is effective in the design and electrical characterization of these transducers.
ISSN:1424-8220
1424-8220
DOI:10.3390/s150101998