Comparison of GeSn alloy films prepared by ion implantation and remote plasma-enhanced chemical vapor deposition methods

Comparison of GeSn alloy films prepared by ion implantation and remote plasma-enhanced chemical vapor deposition methods

Figure S1: (a) Bright field TEM image of a GeSn sample grown by RPECVD with 7.5 at. % Sn and 906 nm. (b) Higher magnification image of one of the Sn rich regions, indicated by the blue arrow in (a), close to the sample surface. Figure S2: (a) A bright field TEM image of GeSn film with 8.3 at. % Sn a...

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Hauptverfasser: Huang, Xingshuo, Lim, Shao Qi, Ratcliff, Tom, Smillie, Lachlan, Grzybowski, Gordon, Claflin, Bruce B. (Chip), WARRENDER, JEFFREY M., Williams, James
Format: Dataset
Sprache:eng
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FOS: Physical sciences
Physical sciences
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Zusammenfassung:Figure S1: (a) Bright field TEM image of a GeSn sample grown by RPECVD with 7.5 at. % Sn and 906 nm. (b) Higher magnification image of one of the Sn rich regions, indicated by the blue arrow in (a), close to the sample surface. Figure S2: (a) A bright field TEM image of GeSn film with 8.3 at. % Sn and a thickness of 942 nm grown by RPECVD on Si; (b) a SADP taken from the circular region in (a), where the ⅓:⅓ diffraction spots are illustrated.
DOI:10.60893/figshare.jvb.25869472