Sub-Bandgap External Quantum Efficiency in Ti Implanted Si Heterojunction with Intrinsic Thin Layer Cells

In this work we present the manufacturing processes and results obtained from the characterization of heterojunction with intrinsic thin layer solar cells that include a heavily Ti ion implanted Si absorbing layer. The cells exhibit external circuit photocurrent at photon energies well below the Si...

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Veröffentlicht in:Japanese Journal of Applied Physics 2013-12, Vol.52 (12), p.122302-122302-5
Hauptverfasser: Silvestre, Santiago, Boronat, Alfredo, Colina, Mónica, Castañer, Luis, Olea, Javier, Pastor, David, Prado, Alvaro del, Mártil, Ignacio, González-Díaz, Germán, Luque, Antonio, Antolín, Elisa, Hernández, Estela, Ramiro, Iñigo, Artacho, Irene, López, Esther, Martí, Antonio
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Sprache:eng
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Zusammenfassung:In this work we present the manufacturing processes and results obtained from the characterization of heterojunction with intrinsic thin layer solar cells that include a heavily Ti ion implanted Si absorbing layer. The cells exhibit external circuit photocurrent at photon energies well below the Si bandgap. We discuss the origin of this below-bandgap photocurrent and the modifications in the hydrogenated amorphous intrinsic Si layer thickness to increase the open-circuit voltage.
ISSN:0021-4922
1347-4065
DOI:10.7567/JJAP.52.122302