Suppression of plasma-induced damage on GaN etched by a Cl 2 plasma at high temperatures

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Veröffentlicht in:	Japanese Journal of Applied Physics 2015-06, Vol.54 (6S2), p.6
Hauptverfasser:	Liu, Zecheng, Pan, Jialin, Kako, Takashi, Ishikawa, Kenji, Takeda, Keigo, Kondo, Hiroki, Oda, Osamu, Sekine, Makoto, Hori, Masaru
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Sprache:	eng
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creator	Liu, Zecheng Pan, Jialin Kako, Takashi Ishikawa, Kenji Takeda, Keigo Kondo, Hiroki Oda, Osamu Sekine, Makoto Hori, Masaru
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doi_str_mv	10.7567/JJAP.54.06GB04
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source	IOP Publishing Journals; Institute of Physics (IOP) Journals - HEAL-Link
title	Suppression of plasma-induced damage on GaN etched by a Cl 2 plasma at high temperatures
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