Throughput comparison of multiexposure and multibeam laser interference lithography on nanopatterned sapphire substrate process

Throughput comparison of multiexposure and multibeam laser interference lithography on nanopatterned sapphire substrate process

In this research, we describe a new approach, i.e., laser interference lithography (LIL), to fabricating pattern sapphire substrate (PSS) and nanopatterned sapphire substrate (NPSS). There are two ways to pattern hexagonal 2D arrays on sapphire by LIL: multiexposure LIL and multibeam LIL. In conclus...

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Veröffentlicht in:Japanese Journal of Applied Physics 2014-06, Vol.53 (6S), p.6-1-06JF05-6
Hauptverfasser: Lin, Te-Hsun, Huang, Tze-Bin, Yang, Yin-Kuang, Tseng, Kuo-Chun, Fu, Chien-Chung
Format: Artikel
Sprache:eng
Schlagworte:
Arrays
Interference
Lasers
Lithography
Nanostructure
Photoresists
Sapphire
Simulation
Two dimensional
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Zusammenfassung:In this research, we describe a new approach, i.e., laser interference lithography (LIL), to fabricating pattern sapphire substrate (PSS) and nanopatterned sapphire substrate (NPSS). There are two ways to pattern hexagonal 2D arrays on sapphire by LIL: multiexposure LIL and multibeam LIL. In conclusion, the simulation results in this research verified that multibeam LIL has significantly better throughput than multiexposure LIL. The result also supports the advantages of a negative photoresist over a positive photoresist.
ISSN:0021-4922
1347-4065
DOI:10.7567/JJAP.53.06JF05